Magnetic properties of Fe₃O₄ antidot arrays synthesized by AFIR: atomic layer deposition, focused ion beam and thermal reduction

• Juan L. Palma,
• Alejandro Pereira,
• Raquel Álvaro,
• José Miguel García-Martín and
• Juan Escrig

Beilstein J. Nanotechnol. 2018, 9, 1728–1734, doi:10.3762/bjnano.9.164

• .9.164 Abstract Magnetic films of magnetite (Fe3O4) with controlled defects, so-called antidot arrays, were synthesized by a new technique called AFIR. AFIR consists of the deposition of a thin film by atomic layer deposition, the generation of square and hexagonal arrays of holes using focused ion beam

• milling, and the subsequent thermal reduction of the antidot arrays. Magnetic characterizations were carried out by magneto-optic Kerr effect measurements, showing the enhancement of the coercivity for the antidot arrays. AFIR opens a new route to manufacture ordered antidot arrays of magnetic oxides with

• variable lattice parameters. Keywords: antidot arrays; atomic layer deposition; focused ion beam; magnetic properties; thermal reduction; Introduction Magnetic antidots, magnetic thin films with periodic arrays of holes, are currently an important topic for both the fundamental understanding of low

Field-controlled ultrafast magnetization dynamics in two-dimensional nanoscale ferromagnetic antidot arrays

• Anulekha De,
• Sucheta Mondal,
• Sourav Sahoo,
• Saswati Barman,
• Yoshichika Otani,
• Rajib Kumar Mitra and
• Anjan Barman

Beilstein J. Nanotechnol. 2018, 9, 1123–1134, doi:10.3762/bjnano.9.104

• for Basic Sciences, Block JD, Sector III, Salt Lake, Kolkata 700 106, India 10.3762/bjnano.9.104 Abstract Ferromagnetic antidot arrays have emerged as a system of tremendous interest due to their interesting spin configuration and dynamics as well as their potential applications in magnetic storage

• previously. Results and Discussion 25 × 25 μm2 arrays of two-dimensional Py antidot arrays with triangular holes arranged in hexagonal lattice symmetry have been fabricated by a combination of electron-beam lithography, electron-beam evaporation and ion milling [20]. Figure 1a,b shows the scanning electron

• micrographs (SEMs) of the two hexagonal antidot arrays, S1 and S2. The edge length of the triangular holes is about 200 nm and the separation between the nearest edges for the two samples is about 200 nm and 500 nm, respectively (lattice constants (a) are 400 nm and 700 nm, respectively). About ±5% deviation

Magnetic switching of nanoscale antidot lattices

• Ulf Wiedwald,
• Joachim Gräfe,
• Kristof M. Lebecki,
• Maxim Skripnik,
• Felix Haering,
• Gisela Schütz,
• Paul Ziemann,
• Eberhard Goering and
• Ulrich Nowak

Beilstein J. Nanotechnol. 2016, 7, 733–750, doi:10.3762/bjnano.7.65

• comprehensive contribution. We start the discussion with a technical section on the achievements and limitations of magnetic antidot arrays by bottom-up nanosphere lithography and specially developed characterisation and simulation tools. We show that the development of a proper spatially resolving magnetometry

• nanosphere lithography, the quality of self-assembled antidot arrays is primarily determined by the size distribution of the particles, and the long-range order of their self-assembled monolayer. While top-down techniques like e-beam lithography usually require a multi-step, laborious preparation process

• of sphere diameters at relatively narrow size distributions. However, the control of the self-assembly process leading to optimized samples is still challenging. Figure 1 presents the entire preparation process of magnetic antidot arrays. In order to prepare such arrays on a large scale with